UHV Si Molecular Beam Epitaxiy Growth and Analysis System

Location: B122 Gerstacker Building

 

This is a state of the art ultra-high vacuum e-beam evaporation system complete with RHEED, LEED, Auger electron spectroscopy, Mass Spectroscopy.
This facility is located beneath the Center for Ultrafast Optical Sciences and has expanded capabilites including ultrafast pulsed laser deposition and film modification tools.





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